Silicon Carbide Vacuum Sintering Furnace Technology

Silicon Carbide (SiC), as the name suggests, is a semiconductor material composed of the elements carbon and silicon. Usually, most of the semiconductor chips seen in the market are basically made of silicon as the main raw material. Silicon carbide (SiC) can be used as a semiconductor material, mainly because of its resistance to high temperature, high frequency and high pressure.

Vacuum water quenching furnace technology analysis

Silicon Carbide Chemical Vapor Deposition (SiC-CVD) Technology

Silicon carbide coating is not a simple coating common in our daily life. It is a high-temperature chemical reaction that grows a dense, pure film of silicon carbide crystals on the surface of a substrate. You can think of this as a “crystal epitaxial growth” process rather than a simple physical coating. The film is microscopically highly organized and has the same excellent properties as bulk silicon carbide crystals. It inherits all of the excellent properties of silicon carbide and offers revolutionary surface enhancements for a wide range of substrates.

Vacuum diffusion welding equipment

In thevast industrial world, there's a welding technology that can join the same and different kinds of metal materials. It can also connect metal with ceramics and composite materials. That is vacuum diffusion welding.

vacuum carburizing gas quenching furnace

Today we will introduce the vacuum carburizing gas quenching furnace developed by ACME. This equipment is mainly used for vacuum carburizing or carbonitriding heat treatment processes of key parts in the fields of aerospace, weapons, etc.

ACME breaks through ton-level mass production technology for high-purity AlON powder, promoting advanced optical ceramic research and application

Since its discovery, aluminum nitride (AlON) has garnered significant attention due to its exceptional properties.