קלאַסאַפאַקיישאַן
רוף אונז
+86-151 7315 3690 (דזשעסי מאָביל)
ACME Xingsha ינדוסטריאַל פּאַרק, מזרח ליאַנגטאַנג רד. , טשאַנגשאַ סיטי, הונאַן
CVD אויוון (SiC, BN)
Furnace used for anti-oxidation coating, matrix material character change and etc. by using Silicohydride gas source. It has both horizontal and vertical structures.
אָנפרעג
- טעכניש פֿעיִקייטן
- פֿאַרבונדענע אַפּשאַנאַל קאַנפיגיעריישאַן
באַשרייַבונג
Furnace used for anti-oxidation coating, matrix material character change and etc. by using Silicohydride gas source. It has both horizontal and vertical structures.
אַפּפּליקאַטיאָן:SiC coating for C/C composite material, SiC coating for graphite, SiC, BN and ZrC coating for fiber and etc.
Specifications of CVD Furnace
מאָדעל ספּעק | אַרבעט זאָנע גרייס (W × H × L) (mm) | מאַקס. טעמפּעראַטור (°C) | טעמפּעראַטור וניפאָרמאַטי (°C) | לעצט וואַקוום (פּאַ) | דרוק פאַרגרעסערן קורס (פּאַ/ה) |
HCVD-060609-SiC | 600 × 600 × 900 | 1500 | ± קסנומקס | 1-100 | 0.67 |
HCVD-101015-SiC | 1000 × 1000 × 1500 | 1500 | ± קסנומקס | 1-100 | 0.67 |
HCVD-121220-SiC | קסנומקס × קסנומקס × קסנומקס | 1500 | ± קסנומקס | 1-100 | 0.67 |
HCVD-151530-SiC | קסנומקס × קסנומקס × קסנומקס | 1500 | ± קסנומקס | 1-100 | 0.67 |
HCVD-252035-SiC | קסנומקס × קסנומקס × קסנומקס | 1500 | ± קסנומקס | 1-100 | 0.67 |
VCVD-0305-SiC | ×300 × 500 | 1500 | ± קסנומקס | 1-100 | 0.67 |
VCVD-0608-SiC | ×600 × 800 | 1500 | ± קסנומקס | 1-100 | 0.67 |
VCVD-0812-SiC | ×800 × 1200 | 1500 | ± קסנומקס | 1-100 | 0.67 |
VCVD-1120-SiC | ×1100 × 2000 | 1500 | ± קסנומקס | 1-100 | 0.67 |
VCVD-2632-SiC | ×2600 × 3200 | 1500 | ± קסנומקס | 1-100 | 0.67 |
די אויבן פּאַראַמעטערס קענען זיין אַדזשאַסטיד צו די פּראָצעס רעקווירעמענץ, זיי זענען נישט ווי אַקסעפּטאַנס נאָרמאַל, די דעטאַל ספּעק. וועט זיין סטייטיד אין די טעכניש פאָרשלאָג און אַגרימאַנץ. |
טעכניש פֿעיִקייטן
1. Using the most advanced control technology, it can precise control the MTS flow and pressure, the deposition flow is stable and pressure fluctuate in narrow range;
2. Special designed deposition chamber with good sealing effect and great anti-contamination performance;
3. Using multiple deposition channels with uniformity gas flow, without deposition dead corner and perfect deposition surface;
4. It has treatment for the high corrosive gas, flammable and explosive gas , solid dust and low melting point sticky materials during the deposition process;
5. Using newly designed corrosion resistant vacuum pump which has long continuous working hours and low maintenance rate.
Optional Configuration of CVD Furnace
1. Furnace door: screw/hydraulic/manual elevation type;swing opening/parallel opening(large size furnace door); manual tight/ auto lock-ring tight
2. Furnace vessel: all carbon steel/inner layer stainless steel/all stainless steel
3. Furnace hot zone: soft carbon felt/soft graphite felt/rigid composite felt/CFC
4. Heating element and muffle: isostatic press graphite/high purity, strength and density graphite/fine size graphite
5. Process gas system: volume/mass flow-meter
6.Thermocouple: K type/N type/C type/S type