classificação
- Equipamento de tratamento térmico a vácuo
- Equipamento de aquecimento industrial de metalurgia do pó
- Equipamento de aquecimento industrial de compostos C & SiC
- Equipamento de fabricação de pó de atomização
- Novo material
- Equipamento de Pirólise Térmica de Resíduos Sólidos Orgânicos
- Material de carbono de alta pureza e componente de grafite revestido
Contacto
+86-151 7315 3690 (Jessie Mobile)
Parque Industrial ACME Xingsha, East Liangtang Rd. , Cidade de Changsha, Hunan
Forno CVD (SiC、BN)
Furnace used for anti-oxidation coating, matrix material character change and etc. by using Silicohydride gas source. It has both horizontal and vertical structures.
Informações
- Características Técnicas
- Configuração opcional relacionada
Descrição
Furnace used for anti-oxidation coating, matrix material character change and etc. by using Silicohydride gas source. It has both horizontal and vertical structures.
Aplicação:SiC coating for C/C composite material, SiC coating for graphite, SiC, BN and ZrC coating for fiber and etc.
Especificações de CVD Fornalha
Especificação do modelo | Tamanho da zona de trabalho (L × A × C) (mm) | Máx. Temperatura (°C) | Uniformidade de temperatura (°C) | Vácuo Final (Pa) | Taxa de Aumento de Pressão (Pa/h) |
HCVD-060609-SiC | 600 600 × 900 | 1500 | ± 7.5 | 1-100 | 0.67 |
HCVD-101015-SiC | 1000 1000 × 1500 | 1500 | ± 7.5 | 1-100 | 0.67 |
HCVD-121220-SiC | 1200 × 1200 × 2000 | 1500 | ± 10 | 1-100 | 0.67 |
HCVD-151530-SiC | 1500 × 1500 × 3000 | 1500 | ± 10 | 1-100 | 0.67 |
HCVD-252035-SiC | 2500 × 2000 × 3500 | 1500 | ± 10 | 1-100 | 0.67 |
VCVD-0305-SiC | Φ300 × 500 | 1500 | ± 5 | 1-100 | 0.67 |
VCVD-0608-SiC | Φ600 × 800 | 1500 | ± 7.5 | 1-100 | 0.67 |
VCVD-0812-SiC | Φ800 × 1200 | 1500 | ± 7.5 | 1-100 | 0.67 |
VCVD-1120-SiC | Φ1100 × 2000 | 1500 | ± 10 | 1-100 | 0.67 |
VCVD-2632-SiC | Φ2600 × 3200 | 1500 | ± 10 | 1-100 | 0.67 |
Os parâmetros acima podem ser ajustados aos requisitos do processo, eles não são padrão de aceitação, especificações detalhadas. serão indicados na proposta técnica e nos acordos. |
Características Técnicas
1. Using the most advanced control technology, it can precise control the MTS flow and pressure, the deposition flow is stable and pressure fluctuate in narrow range;
2. Special designed deposition chamber with good sealing effect and great anti-contamination performance;
3. Using multiple deposition channels with uniformity gas flow, without deposition dead corner and perfect deposition surface;
4. It has treatment for the high corrosive gas, flammable and explosive gas , solid dust and low melting point sticky materials during the deposition process;
5. Using newly designed corrosion resistant vacuum pump which has long continuous working hours and low maintenance rate.
Configuração opcional do forno CVD
1. Furnace door: screw/hydraulic/manual elevation type;swing opening/parallel opening(large size furnace door); manual tight/ auto lock-ring tight
2. Furnace vessel: all carbon steel/inner layer stainless steel/all stainless steel
3. Furnace hot zone: soft carbon felt/soft graphite felt/rigid composite felt/CFC
4. Heating element and muffle: isostatic press graphite/high purity, strength and density graphite/fine size graphite
5. Process gas system: volume/mass flow-meter
6.Thermocouple: K type/N type/C type/S type